GP200 Series Metal Sealed Pressure-based Mass Flow Controllers

All of the performance. None of the limitations.

GP200 Series is the first fully pressure-insensitive pressure-based mass flow controller (P-MFC) designed specifically for advanced Etch and Deposition processes in semiconductor manufacturing.

The GP200 Series P-MFC features a patented architecture that overcomes the limitations of conventional P-MFCs to provide the most precise process gas delivery even when delivering low vapor pressure process gases. It includes several unique design aspects, including an integrated differential pressure sensor coupled with a downstream valve architecture enabling the most precise process gas delivery over the widest range of operating conditions in the industry.

Since GP200 Series supports such a broad range of process conditions, it can be used as a drop-in replacement and upgrade for many traditional P-MFCs and thermal MFCs. It reduces the complexity and cost of ownership of the gas delivery system because it eliminates the need for components such as pressure regulators and transducers.

Get more details about the design of GP200 Series and see how it works.

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GP200 Series Data Sheet

Features

  • True differential pressure measurement
  • Lower inlet pressure operation
  • Downstream valve architecture
  • Matched transient response
  • Zero Leak-by Control Valve
  • MultiFloTM technology offers unparalleled flexibility—one device can be programmed for thousands of different gas and flow range configurations without removing the MFC from the gas line or compromising accuracy
  • Local display indicates flow, temperature, pressure and network address
  • DeviceNetTM, EtherCAT®, RS-485 L-Protocol and analog interfaces

Benefits

  • By removing the requirement to match and compensate two separate pressure transducers, the GP200 differential pressure technology reduces measurement uncertainty for enhanced accuracy, repeatability and drift performance.
  • Safer fab operation at lower inlet pressures is now achievable with a P-MFC due to the GP200 differential pressure sensor that is specifically optimized for low differential pressure measurement.
  • The downstream valve architecture ensures accuracy is independent of downstream pressure, enabling flow delivery into pressures as high as 1200 Torr. The fast closing valve addresses non-productive recipe wait times, or "tail effects," seen in upstream MFC valve designs that require additional time to bleed down their internal volume of gas.
  • Ultra-fast, highly repeatable ascending and descending flow stabilization time enables tighter process control in advanced high cycle Deposition and Etch processes.
  • 100X improvement in valve shut-down
  • With MultiFloTM, MFC full scale flow range can be re-scaled down typically by a factor of 3:1 with no impact on accuracy, turndown or leak by specifications, for optimum process and inventory flexibility 
  • Convenient user display and independent diagnostic/service port aids device installation, monitoring and troubleshooting

Key Applications

  • Semiconductor manufacturing
  • Etch
  • Chemical Vapor Deposition (CVD)
  • Gas flow control applications that require a high purity all-metal flow path
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    Product Type

    Mass Flow Controller

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    Differentiator

    Fully Pressure Insensitive P-MFC

    Most Precise Process Gas Delivery Over the Widest Range of Operating Conditions


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    Performance
    {0CE6BA5F-82D2-4A23-A562-F0F2CF5BBDE9}
    Flow Range (Full Scale Capacity)

    3 sccm - 50,000 sccm

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    Accuracy

    Zero Leak Valve

    1% S.P. (5-100% F.S.)

    0.05% F. S. (0.5-5% F.S.)


    Metal Seal Valve

    1% S.P. (5-100% F.S.)

    0.05% F. S. (2-5% F.S.)


    {2F0B3742-3DC0-46F9-AE8D-D1B0E4B5D92C}
    Repeatability
    < ±0.15% S.P.
    {617316A7-AF88-4EB8-AB73-11C5BB8569B0}
    Response Time

    280 ± 20 ms Matched Transient Response, for any ascending or descending non-zero setpoint

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    Multi-Gas & Range Configurability
    MultiFlo™ Standard
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    Pressure Transient Insensitivity

    <± 1% S.P. up to 40 psi/sec inlet pressure spike


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    Control Range

    Zero Leak Valve

    0.5 - 100% F.S.


    Metal Seal Valve

    2 - 100% F.S.

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    Number of Bins

    Nine (9) standard bin ranges

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    Zero Stability
    < ±0.15% F.S. per year

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    Flow Temperature Coefficient

    Zero: 0.005% F.S. per °C

    Span: 0.05% S.P. per °C

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    Mechanical
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    Seal Material

    Metal

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    Level of Purity / Surface Finish
    5µ inch Ra avg
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    Wetted Materials

    316L

    Hastelloy C-22

    316/316L Stainless Steel

    304 Stainless Steel

    KM-45

    PCTFE

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    Valve Options

    Normally Closed

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    Ratings
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    Max Temperature
    60oC
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    Differential Pressure Range

    Min: 7 psid

    Max: up to 50 psid

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    Max Pressure

    150 psia

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    Diagnostics & Display
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    Diagnostic Capability
    Available

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    Status Lights

    DeviceNet

    MFC Health

    Network Status


    EtherCAT

    Run

    Error

    Power

    Network Status


    RS-485 (analog)

    Network Status

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    Alarms

    Process Control Deviations

    Flow

    Temperature

    *For full list of alarms see supplemental communication manuals

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    Diagnostic / Service Port

    RS-485 via micro-USB

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    Display

    Top Mount Integrated LCD

    Viewing Angle: Rotatable

    Viewing Distance: 10 feet

    Units Displayed: Flow (%), Temp (°C), Pressure (psia, kPa)

    Resolution: 0.1 (unit)

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    Electrical
    {394DECA1-6F9A-4696-A51E-7FDA4BEF0D89}
    Analog Communication

    0-5 Vdc

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    Digital Communication

    DeviceNet™

    EtherCAT®

    RS-485 L-Protocol

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    Electrical Connection

    Analog/RS-485 via 9-Pin "D" connector

    DeviceNet™ via 5-Pin "M12" connector

    EtherCAT® via RJ45 jacks, Power via 5-pin M8 connector


    {EEACA90E-E709-45B6-9A80-A50561C69A52}
    Power Supply / Consumption

    Analog/RS-485 L Protocol: 6 Watts max @ ±15 Vdc (±10%) or +24 Vdc (±10%)

    DeviceNet™: 545 mA max @ +11-25 Vdc, 250 mA max @ 24 Vdc

    EtherCAT™: 360 mA max @ +18-30 Vdc, 270 mA max @ 24 Vdc

    (Under typical operating conditions)

    {48A177B5-FADD-4FFF-BC32-A221C7701131}
    Compliance
    {2EFFEC5B-05E3-46D1-A562-5981B2FE61C2}
    EMC

    2014/30/EU EMC Directive EN:61326-1: 2013

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    Environmental Compliance

    2011/65/EU & 2015/863/EU RoHS Directive

    EC 1907/2006 REACH Directive

    Filename File Type Documents By Language
    Data Sheet pdf English
    Installation and Operation Manual pdf English
    Standard Bin Gas Listing pdf English
    Low Pressure Bin Gas Listing pdf English
    0250 Series
    Controls and powers up to 4 devices
    MultiFlo™ Configurator
    A comprehensive gas database enabling you to configure your MultiFlo™ capable MFC for thousands of gas types and ranges without removing it from the gas line.