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Metal Sealed Thermal Mass Flow Controllers & Meters

Highest-purity flow path. Ultra-precise, contaminant-free control.
Many of today’s advanced electronic device fabrication processes require extremely accurate and highly repeatable measurement and control of expensive ultra-pure gases and liquid precursors. Brooks Instrument meets those needs with our game-changing metal sealed thermal mass flow controllers and meters. Precise chemistry control is achieved through the combination of ultra-stable, highly accurate measurement sensors, fast precision control valves and powerful digital electronics. Purity of the process chemistry is ensured by our high-integrity (leak tight), ultra-high purity, all-metal wetted flow path, designed to keep outside contaminants like moisture and oxygen from corrupting the process media. 

Key Applications

  • Silicon semiconductor device fabrication processes – Etch, Strip, CVD, ALD, PVD, Epi, Diffusion, Implant and RTP
  • Compound semiconductor device fabrication processes – MOCVD
  • Precision engineered surface coatings
  • Analytical systems
  • Vacuum processes applications
Select the mass flow device that best serves your process requirements.

PRODUCTS

GF125 Series
GF125 Series
GF100 Series EtherCAT
GF100 Series EtherCAT
GF100 Series
GF100 Series
GF80 Series
GF80 Series
5850EM Series
5850EM Series
Product Type

Mass Flow Controller

Mass Flow Controller

Mass Flow Controller

Mass Flow Controller

Mass Flow Controller
Differentiator

Ultra-High Purity

Ultra-Fast Response Time

Pressure Transient Insensitivity

EtherCAT Communication

High Purity/Ultra-High Purity

Embedded Diagnostics

Ultra-stable Flow Sensor

Improved Valve Shutdown

High Purity/Ultra-High Purity

Standard GF Series

High Flow GF Series

High Purity

Large installed base with proven long term performance

Flow Range (Full Scale Capacity)

3 sccm - 300 slm

Standard GF Series: 3 sccm - 55 slm

High Flow GF Series: 55 slm - 300 slm

Standard GF Series: 3 sccm - 55 slm

High Flow GF Series: 55 slm - 300 slm

3 sccm - 300 slm .06 sccm - 30,000 sccm
Seal Material

Metal

Metal Metal Metal Metal
Level of Purity / Surface Finish 4 - 5µ inch Ra

5 - 10µ inch Ra

4 - 10µ inch Ra 16µ inch Ra

316L VAR, 316L, and high alloy ferritic stainless steel

Accuracy

±1% S.P. > 35-100%

±0.35% F. S. 2-35%

Standard GF Series: ±1% S.P. > 20-100%; ±0.2% F.S. 2-20%

High Flow GF Series: ±1% S.P. > 35-100%; ±0.35% F.S. 2-35%

±1% S.P. > 35-100%

±0.35% F.S. 2-35%

±1% S.P. 35-100%

±0.35% F.S. < 5-35%

1% F.S. incl. linearity

1.5% F.S. incl. linearity >20 slpm

Repeatability < ±0.15% S.P. < ±0.15% S.P. < ±0.15% S.P. < ±0.2% S.P.

0.2% of rate

Response Time

300ms - < 1 sec

Normally Closed Valve: 300 ms - < 1 sec

SDS Gas Delivery: < 3 sec

Normally Closed Valve: 700 ms - < 1 sec

SDS Gas Delivery: < 3 sec

Normally Closed Valve: <1 sec

Normally Closed Valve: <3 sec

Optional: 600 msec

Pressure Transient Insensitivity

<5% S.P. for up to 5 psi/sec upstream press. spike

Specific models

Multi-Gas & Range Configurability MultiFlo™ Standard (most models) MultiFlo™ Standard (most models) MultiFlo™ Standard (most models) MultiFlo™ Available

Diagnostic Capability Available

Available

Available

Available

Analog Communication

0-5 Vdc

0-5 Vdc

0-20 mA

4-20 mA

0-5 Vdc

0-10 Vdc

4-20 mA

0-5 Vdc

Digital Communication

DeviceNet™

RS485 L-Protocol

EtherCAT®

DeviceNet™

RS485 L-Protocol

DeviceNet™ 

Profibus®

RS485 S-Protocol

RS485 L-Protocol

RS485 A-Protocol (GF081)