2.5X Faster Flow Stabilization for Increased Wafer Throughput.
Ultra-fast, Highly Repeatable Response for Both Ascending and Descending Flow Stabilization Time With No Long Bleed-down Time Delays
GP200 Series is unaffected by varying back-pressures from pulsed gas injection, mixing manifolds and flow splitter sub-assemblies. The exclusive downstream valve architecture allows error to be independent of downstream pressure by isolating the laminar flow element and ΔP sensor from downstream cross-talk (pressure variations), enabling flow delivery into downstream pressures as high as 1200 Torr.
With no variable internal volume of gas to deplete, the downstream valve enables rapid shutdown and switching of recipe set points for pulsed gas delivery. Transient variations can lead to film thickness variations as well as electrical variations.
The matched transient response with fast step-down response removes long bleed-down time delays when transitioning to low-flow set points (removes “tail effects”).