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High & Ultra-High Purity Pressure Controllers

Challenge: Enhance use of pressure control for improved tool results

Every system that measures and controls process gas flow can enhance deposition control and process performance through simultaneous – and precise –  pressure measurement and control. Many fabs use centralized bulk gas sources and vapor cabinets to serve dozens of tools; because there is an unavoidable pressure differential between the inlet side and the outlet side of an MFC, tool efficiency and wafer quality (yield) can only go up through real-time pressure management.

Solution: PC100 Series Ultra-High Purity Digital Pressure Controllers

Built on the proven Brooks GF100 mass flow controller technology, the PC100 Series features a high-purity all-metal flow path, enhanced sensor technology and advanced diagnostics capability that makes it much easier to conduct device evaluation and troubleshooting.

The key to its outstanding performance is its exacting pressure measurement and control capabilities. Based on the proven performance of the Brooks GF100, the technology inside the PC100 Series eliminates the challenges caused by sensor drift, for ultra-precise pressure measurement and control.

The PC100 Series features a proprietary highly corrosion-resistant Hastelloy® C-22 sensor that provides improved pressure measurement and control at low setpoints, superior reproducibility at elevated temperatures and enhanced long-term stability. Combined with features that enable faster response and settling times, tool builders and end users who implement Brook Instrument semiconductor pressure controllers have the potential to achieve reduced downtime and improved productivity.