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HOLIDAY HOURS: All Brooks Instrument facilities in the USA will be closed December 23, 26, 30 and January 2. For holiday hours of our facilities across the globe, please contact the specific location directly.

Metal Sealed Thermal Mass Flow Controllers & Meters

Highest-purity flow path. Ultra-precise, contaminant-free control.
Many of today’s advanced electronic device fabrication processes require extremely accurate and highly repeatable measurement and control of expensive ultra-pure gases and liquid precursors. Brooks Instrument meets those needs with our game-changing metal sealed thermal mass flow controllers and meters. Precise chemistry control is achieved through the combination of ultra-stable, highly accurate measurement sensors, fast precision control valves and powerful digital electronics. Purity of the process chemistry is ensured by our high-integrity (leak tight), ultra-high purity, all-metal wetted flow path, designed to keep outside contaminants like moisture and oxygen from corrupting the process media. 

Key Applications

  • Silicon semiconductor device fabrication processes – Etch, Strip, CVD, ALD, PVD, Epi, Diffusion, Implant and RTP
  • Compound semiconductor device fabrication processes – MOCVD
  • Precision engineered surface coatings
  • Analytical systems
  • Vacuum processes applications
Select the mass flow device that best serves your process requirements.

PRODUCTS

GF135 Series
GF135 Series
GF125 Series
GF125 Series
GF100 Series
GF100 Series
GF80 Series
GF80 Series
5850EM Series
5850EM Series
Product Type Mass Flow Controller

Mass Flow Controller

Mass Flow Controller

Mass Flow Controller

Mass Flow Controller
Differentiator

Real-Time Flow Error Detection

Advanced Diagnostics

Ultra-High Purity

Ultra-Fast Response Time

Pressure Transient Insensitivity

High Purity/Ultra-High Purity

Standard GF Series

High Flow GF Series

High Purity

Large installed base with proven long term performance

Flow Range (Full Scale Capacity)

3 sccm - 5 slm (N2 Eq.)

3 sccm - 300 slm

Standard GF Series: 3 sccm - 55 slm

High Flow GF Series: 55 slm - 300 slm

3 sccm - 300 slm .06 sccm - 30,000 sccm
Seal Material

Metal

Metal

Metal Metal Metal
Level of Purity / Surface Finish 4µ inch Ra
4 - 5µ inch Ra 4 - 10µ inch Ra 16µ inch Ra

316L VAR, 316L, and high alloy ferritic stainless steel

Accuracy

±1% S.P. 10-100% F.S.

±1% S.P. plus ±0.04% F.S. 2-10% F.S.

±1% S.P. > 35-100%

±0.35% F. S. 2-35%

±1% S.P. > 35-100%

±0.35% F.S. 2-35%

±1% S.P. 35-100%

±0.35% F.S. < 5-35%

1% F.S. incl. linearity

1.5% F.S. incl. linearity >20 slpm

Repeatability < ±0.15% S.P. < ±0.15% S.P. < ±0.15% S.P. < ±0.2% S.P.

0.2% of rate

Response Time

<300 ms (<860 sccm N2 equivalent)

<400 ms (861-5000 sccm N2 equivalent)

(to within ±2% FS)

<300 ms (<860 sccm N2 equivalent)

<400 ms (861-5000 sccm N2 equivalent)

(to within ±2% FS)

<300 ms (<860 sccm N2 equivalent)

<400 ms (861-5000 sccm N2 equivalent)

(to within ±2% FS)

300ms - < 1 sec

Normally Closed Valve: 700 ms - < 1 sec

SDS Gas Delivery: < 3 sec

Normally Closed Valve: <1 sec

Normally Closed Valve: <3 sec

Optional: 600 msec

Pressure Transient Insensitivity

< 1% S.P. for up to 5 psi/sec upstream press. spike

<5% S.P. for up to 5 psi/sec upstream press. spike

Multi-Gas & Range Configurability

MultiFlo™ Standard (most models) MultiFlo™ Standard (most models) MultiFlo™ Available

Diagnostic Capability Available

Available

Available

Available

Analog Communication

0-5 Vdc

0-5 Vdc

0-5 Vdc

0-20 mA

4-20 mA

0-5 Vdc

0-10 Vdc

4-20 mA

0-5 Vdc

Digital Communication

DeviceNet™

RS485

DeviceNet™

RS485 L-Protocol

DeviceNet™

RS485 L-Protocol

DeviceNet™ 

Profibus®

RS485 S-Protocol

RS485 L-Protocol

RS485 A-Protocol (GF081)