Challenge: Enhance use of pressure control for improved tool results
Every system that measures and controls process gas flow can enhance deposition control and process performance by simultaneously – and precisely – measuring and controlling pressure. Many fabs use centralized bulk gas sources and vapor cabinets to serve dozens of tools; because there is an unavoidable pressure differential between the inlet side and the outlet side of an MFC, tool efficiency and wafer quality (yield) can only go up through real-time pressure management.
Solution: PC100 Series Ultra-High Purity Digital Pressure Controllers
Built on the proven Brooks GF100 mass flow controller technology, the PC100 Series features a high-purity all-metal flow path, enhanced sensor technology and advanced diagnostics capability that makes it much easier to conduct device evaluation and troubleshooting.
The PC100 Series features a proprietary highly corrosion-resistant Hastelloy® C-22 sensor that provides improved accuracy at low setpoints, superior reproducibility at elevated temperatures and enhanced long-term stability. Combined with features that enable faster response and settling times, tool builders and end users who implement Brook Instrument semiconductor pressure controllers have the potential to achieve reduced downtime and improved productivity.