Skip links

HOLIDAY HOURS: All Brooks Instrument facilities in the USA will be closed December 23, 26, 30 and January 2. For holiday hours of our facilities across the globe, please contact the specific location directly.

GF135 Series Real-Time Flow Error Detection Metal Sealed Thermal Mass Flow Controllers

Performance and intelligence.
Models GF135

Keep critical flow processes on-target and maximize throughput with the GF135 Advanced Diagnostics Pressure Transient Insensitive (PTI) mass flow controller. The world’s first “smart” mass flow controller is a true game changer: It performs integral rate-of-decay flow measurement without stopping the flow of process gas. It allows semiconductor manufacturers to verify process gas accuracy, check valve leak-by and monitor sensor stability in real time without removing the flow controller from the gas line.

Combined with an all-metal wetted flow path, ultra-fast settling times and industry-leading process gas accuracy, the GF135 PTI MFC has the potential to transform the productivity and throughput rates for a wide range of deposition processes.


Talk to one of our application engineering experts:

Call: 1-888-554-3569

Want to see it in action?

Request a Demo

Need the numbers?

Get a Quote


  • Long-term zero stability of <±0.5% full scale per year
  • Ultra-fast settling times: <300 ms - <400 ms
  • Full-scale flow rates: 3 sccm to 5 slm
  • Ultra-high purity flow path - 4µ inch Ra surface finish
  • Embedded real-time flow error detection and trending using Rate of Decay (ROD) techniques
  • Enhanced process gas accuracy - up to three times improvement - through advanced gas modeling optimized through actual gas testing
  • Third generation pressure transient insensitivity (PTI) technology
  • High visibility, electronically rotatable LCD display provides local indication of flow, temperature, pressure and network address
  • DeviceNet™, RS-485 and analog interfaces


  • Real-time flow error detection enables faster adjustments to flow deviations and supports wafer yield improvement
  • Sensor stability tracking improves system uptime by supporting predictive maintenance
  • Valve leak-by tracking helps minimize first wafer effects
  • Enhanced process gas accuracy meets process gas chemistry control challenges at 10 nm
  • Market leading flow settling time reduces non-productive flow stabilization steps, supporting advanced 3D device processing
  • Enhance pressure insensitivity delivers superior process gas control for enhanced etch and deposition control
  • Corrosion-resistant Hastelloy® sensor provides unmatched long-term sensor stability ensuring maximum yield and throughput
  • Drop-in replacement for surface-mount and VCR MFCs is an easy upgrade for critical gas lines on existing systems


  • Semiconductor advanced etch tools
  • Low vapor pressure gases: Boron Trichloride (BCl3), Trichlorosilane (SiHCl3)
Product Type
Mass Flow Controller

Real-Time Flow Error Detection

Advanced Diagnostics

Flow Range (Full Scale Capacity)

3 sccm - 5 slm (N2 Eq.)

Pressure Transient Insensitivity

< 1% S.P. for up to 5 psi/sec upstream press. spike


±1% S.P. 10-100% F.S.

±1% S.P. plus ±0.04% F.S. 2-10% F.S.

< ±0.15% S.P.

Included in accuracy

Response Time

<300 ms (<860 sccm N2 equivalent)

<400 ms (861-5000 sccm N2 equivalent)

(to within ±2% FS)

<300 ms (<860 sccm N2 equivalent)

<400 ms (861-5000 sccm N2 equivalent)

(to within ±2% FS)

<300 ms (<860 sccm N2 equivalent)

<400 ms (861-5000 sccm N2 equivalent)

(to within ±2% FS)

Multi-Gas & Range Configurability

Control Range

1 - 100%

Valve Shut Down

< 0.5% of F.S. N2

Zero Stability
< ±0.5% F.S. per year
Flow Temperature Coefficient

Span: 0.05% S.P./°C

Zero: 0.005% F.S./°C

Seal Material


Level of Purity / Surface Finish
4µ inch Ra
Wetted Materials

SEMI F20 HP Compliant


Hastelloy C-22

316L Stainless Steel

304 Stainless Steel


Valve Options

Normally Closed

Max Temperature


Differential Pressure Range

3-860 sccm = 7-45 psid

861 - 5000 sccm = 10-45 psid

*Typical pressure drops. Contacts Brooks Technical Support for more information.

Max Pressure

100 psia max

Leak Integrity
1x10-10 atm cc/sec He
Diagnostics & Display
Diagnostic Capability

Status Lights

MFC Health

Network Status


Sensor Output, Control Valve Output, Over Temperature, Power Surge/Sag, Network Interruption, Sensor Drift, Flow Error, Valve Leak

Diagnostic / Service Port

RS485 via 2.5mm jack


Top Mount Electronically Rotatable Integrated LCD

Viewing Angle: Fixed

Viewing Distance: 10 feet

Units Displayed: Flow (%), Temp (°C), Pressure (psia, kPa)

Resolution: 0.1 (unit)

Analog Communication

0-5 Vdc

Digital Communication



Electrical Connection

Analog/RS485 via 9-Pin "D" connector

DeviceNet™ via 5-Pin "M12" connector

Power Supply / Consumption

Analog/RS485: 6 Watts max @ ±15 Vdc (±10%) or +24 Vdc (±10%)

DeviceNet™: 545 mA max @ +11-25 Vdc, 250 mA max @ 24 Vdc

(Under typical operating conditions)


EC Directive 2004/108/EC

CE: EN61326-1: 2006 (FCC Part 15 & Canada IC-subset of CE testing)

Environmental Compliance

RoHS Directive (2011/65/2006)

REACH Directive EC 1907/2006

Flow Range (Full Scale Capacity) 3 sccm - 5 slm (N2 Eq.)
Response Time

<300 ms (<860 sccm N2 equivalent)

<400 ms (861-5000 sccm N2 equivalent)

(to within ±2% FS)

Gases Supported

Ar, BCl3, C4F6-q (@ 800 Torr), C4F8 (@ 1200 Torr), C5F8, CF4, CH2F2, CH3F, CHF3, Cl2, CO2,

H2, HBr, He, N2, N2O, NF3, NH3, O2, SF6, SiCl4 (@ 100 Torr), SiH2Cl2, SiH4, SiHCl3

Rate-of-Decay Performance ROD by default is disabled/off. It should not be enabled until after the MFC is installed and properly commissioned.
Surface Finish 4µ inch Ra
FilenameFile TypeDocuments By Language
Data Sheet pdf English
Installation & Operation Manual pdf English
DeviceNetâ„¢ Supplemental Manual - GF100 Series pdf English
RS485 L-Protocol Supplemental Manual - GF100 Series pdf English
GF135 Series Software
Commissioning software that provides users with a simple means to create a performance baseline during initial installation of the MFC.