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Semiconductor Liquid & Vapor Delivery Technology

Challenge: Maximize the purity of liquid vaporization processes

Many conventional vapor delivery systems have fundamental limitations that affect their applicability to highly demanding semiconductor processes. “Bubblers”, or vapor draw systems, are difficult to start and stop, require very close control of temperature and pressure, and are inefficient at generating well controlled vapor mass flow. "Flash vaporizers" that apply heat to the liquid using a hot metal surface are also inefficient at generating vapor mass and frequently can cause thermal decomposition of the liquid precursor. None of these conventional technologies can eliminate the potential for liquid carry-over and the major process contamination this engenders.

Solution: Brooks Instrument DLI Vaporizers

Brooks Instrument DLI (direct liquid injection) vaporizers employ hot gas, rather than a hot metal surface, to accomplish liquid vaporization. As liquid enters the hot gas chamber, it is atomized by a carrier gas stream. Once the atomized liquid contacts the hot gas, it immediately changes to vapor. The result is chemically pure vapor, free of decomposition by-products or liquid carry-over. The result: Semiconductor deposition processes that require liquid-to-vapor creation have the purity and vapor mass flow control required for the highest levels of throughput and wafer quality.