Skip To Content

Semiconductor Manufacturing

thin film coatings

Semiconductor manufacturing is an extremely complex process requiring thousands of precisely controlled steps. Since a majority of these steps utilise critical mixtures of gases, measuring and regulating them is key to consistency, quality and yield. An extensive range of Brooks Instrument solutions including mass flow controllers, pressure controllers, and more are utilised throughout the semiconductor manufacturing process to help ensure successful and profitable outcomes.

Examples of applications:

Pressure-based Mass Flow Controller Provides More Accurate Gas Flow Control for Ozone Applications

Ozone is a powerful oxidiser used in a wide variety of applications within semiconductor manufacturing. It can enable the production of many oxide compounds and complex structures with fast reaction rates, making it a practical choice for semiconductor manufacturing processes. However, thermal decomposition and low-pressure delivery make ozone a challenge to precisely control.


Precise Control of Gas Delivery for Liquid and Solid Precursors

The controlled delivery of vapor from a liquid or solid precursor is an essential requirement for Chemical Vapor Deposition (CVD), Metal Organic Vapor Deposition (MOCVD), and Atomic Layer Deposition (ALD) processes.