Chemical Vapor Deposition, including MOCVD
Many solar thin films are deposited with chemical vapor deposition (CVD) techniques. In this process, a reactive gas is commonly used to deposit material on a substrate in a vacuumchamber. Typically, mass flow controllers with all-metal construction are recommended to eliminate the possibility of contamination from oxygen or water.
The Brooks SLA7800 Series mass flow controller is a perfect solution for CVD applications. The all-metal construction provides very high leak integrity to minimize contamination. A unique metal valve design provides fast response to setpoint and minimum valve leak-by with wide turndown. SLA7800 Series pressure controllers are ideal for bubbler and chamber pressure control.
Other Application Notes
- Basic Flow Control
- Catalyst Research
- Heat Treating, Cutting/Welding, and other Thermal Processes
- Vacuum Processes
- Bioreactors
- Precision Coatings
- Chemical Injection/Dosing Systems
- Process Analyzer Sample Flow
- Rotating Equipment
- Fuel Cell Test Stand
- Device Testing and Metrology
- Level Measurement
- Physical Vapor Deposition
- Chemical Vapor Deposition, including MOCVD
- Transparent Conducting Oxides
- Polysilicon and Crystal Pulling
- Spray Coatings
