Application Notes| Vacuum Processes |
 Brooks offers many products that deliver exceptional performance for vacuum processes such as CVD, ALD, etch, and diffusion. For gas flow control, our wide assortment of gas mass flow controllers permits excellent alignment between application requirements and MFC performance. For example, our B-Series mass flow controllers incorporate active pressure compensation to maintain constant flow despite pressure fluctuations.Brooks also offers electronic pressure controllers – models SLA7810 and SLA7820 for example – for precise chamber pressure control. Brooks Quantim Series Coriolis mass flow controllers provide precision, accuracy, and repeatability for liquid precursor applications. For vaporizing liquid precursors, Brooks has a wide assortment of liquid-to-vapor solutions that provide thorough vaporization without creating particles or other undesirable by-products. Other Application Notes
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